PeakView CMP™ provides full support for advanced process node DFM requirements during EM synthesis and Layout EM extraction. Designers are able to define their own metal fill in a PCircuit description and slotting requirements in the GUI. During EM synthesis, these rules are considered so that PeakView™ delivers a DRC clean layout with the industry’s most accurate EM and circuit simulation models.
Foundry planarization schemes, i.e. chemical mechanical polishing, call for DFM (Design for Manufacture) requirements, especially metal slotting and metal fill. It can be difficult to implement DFM rules during manual inductor design. Complex wide metal slotting, staggered slotting/striping, and via handling during manual design are time-consuming, error-prone design processes that is difficult for general purpose EM solvers to accurately model. Design teams, therefore, request design waivers for these structures in order to pass final signoff to manufacturing. For advanced process nodes, fill requirements need to be adhered to for generating accurate EM models. Obtaining a waiver for DFM requirements adversely impacts yield in advanced nodes 20nm and beyond. HEnce it becomes necessary to consider metal slotting and fill requirements in EM modeling.
PeakView™ solver precision aids in improved manufacturability by preserving model accuracy. During Layout EM, structures with slotting/striping and metal fill are accurately modeled without significant increase in simulation time. There is no longer a need to simplify the layout for modeling purposes, as PeakView™ fully considers metal fill, slotting/striping and massive via structures from within its platform.
- Slotting and striping generation and extraction
- Correct via placement and bridging
- Metal fill generation and modeling