DFM Support: Chemical Mechanical Polishing


PeakView CMP™ provides full support for advanced process node DFM requirements during EM synthesis and Layout EM extraction. Designers are able to define their own metal fill in a PCircuit description and slotting requirements in the GUI. During EM synthesis, these rules are considered so that PeakView™ delivers a DRC clean layout with the industry’s most accurate EM and circuit simulation models.


Foundry planarization schemes, i.e. chemical mechanical polishing, call for DFM (Design for Manufacture) requirements, especially metal slotting and metal fill. For advanced process nodes, fill requirements need to be adhered to for generating accurate EM models. Obtaining a waiver for DFM requirements adversely impacts yield in advanced nodes 20nm and beyond. Hence it becomes necessary to consider metal slotting and fill requirements in EM modeling.


PeakView™ solver precision aids in improved manufacturability by preserving model accuracy. During Layout EM, structures with slotting/striping and metalfill are accurately modeled without significant increase in simulation time. There is no longer a need to simplify the layout for modeling purposes, as PeakView™ fully considers metalfill, slotting/striping and massive via structures from within its platform. Users can define their own metalfill and slotting/stripping requirements with Peakview PCircuits. During EM synthesi, Peakview delivers a DRC clean layout with the industry’s most accurate EM and sub-circuit models. Peakview can also extract layouts from Cadence Virtuoso with no simplification in metalfill, slotting/stripping and via structures. With Peakview CMP, designers can now improve DFM ability without compromised model accuracy.


PeakView CMP™ – Metalfill Synthesis & EM Modeling

Metalfills are usually used in CMP to maintain the planarization in the IC manufacturing process. At higher frequency, the dummy metalfills may impact on both inductance and capacitance of the device. PeakView enables users to synthesize dummy metalfills using PCircuit by a few simple clicks, and can also extract customized metalfill patterns from layout without any simplification. PeakView provides comprehensive modeling methods to model dummy metalfills with the passive devices from DC to mmWave and sub-THz range. The modeling results has been validated from foundry’s silicon data.

  PeakView™ metalfill study

PeakView CMP™ – Metalfill Synthesis

PeakView allows users to generate complex dummy metalfill patterns through dynamic PCircuit, which provides two types of metalfills: square and RectCross. Meanwhile, the customized metalfill structures can be extracted by PeakView in Cadence Virtuoso environment.

PeakView™ metalfill synthesis

New iterative High Capacity Solver (HCS) for Metal Fill EM Simulation & Modeling

A Major breakthroughs in small memory footprint. 5 to 30 time memory reduction is achieved. HCS is becoming the ideal option for large-scale EM simulation such as final layout with metal fills and isolation structures, fullchip EM simulaiton and IC-PKG-PCB, 3DIC EM Co-Simulation needs.
■ Large solving capacity with accuracy rigorously benchmarked against Peakview’s default 3D fullwave direct solver engine.
■ Efficient multicore and QuickEM computing.
■ Difference between the results of 3D fullwave direct solver and HCS is lower than 1%.
■ EM isolation accuracy reaches -110dB with QuickEM on, which is the same as direct solver with QuickEM switch on.❖  .

Key Features

  • Metalfill support
  • Slotting/Stripping support
  • Various Via rules support

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